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Aerosol Assisted Chemical Vapor Deposition of Silicon Thin Films
Silicon thin films play a crucial role in the solar and microelectronics industries. Currently, these films are primarily produced using expensive low-pressure plasma-enhanced chemical vapor deposition (PECVD), which relies on gaseous silanes but suffers from low precursor utilization efficiency. The instability and low vapor pressure of liquid hydrosilanes...
Published: 12/1/2025
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Inventor(s): Guruvenket Srinivasan, Robert Sailer, Justin Hoey
Keywords(s): CNSE Invention
Category(s): Technologies > Chemistry & Materials, Technologies > Nanotechnology
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